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Microstructure and composition design of magnetic Ni-Mn-Sn Co-sputter deposited films

dc.contributor.authorQuintana Nedelcos, Aris
dc.contributor.authorSánchez Llamazares, José Luis
dc.contributor.authorTupak García_Fernández
dc.contributor.editorSCIENCEDOMAIN international
dc.date.accessioned2018-04-03T19:23:21Z
dc.date.available2018-04-03T19:23:21Z
dc.date.issued2015
dc.identifier.citationA. Quintana-Nedelcos, J. L. Sanchez-Llamazares, T. García-Fernández, S. Guvenc, M. Yumak & C. García. (2015). Microstructure and Composition Design of Magnetic Ni-Mn-Sn Co-sputter Deposited Films. Journal of Scientific Research and Reports, 6, 476-482. DOI : 10.9734/JSRR/2015/16672
dc.identifier.urihttp://hdl.handle.net/11627/3786
dc.description.abstract"In this work, we study the effect of the substrate temperature (ST) during sputter-deposition as well as co-sputtering deposition on the fabrication of nanostructured Ni-Mn-Sn thin films. Sputtered films show Mn losses of around 10 at.% while the average grain size (<d>) increased from 30 nm to 105 nm with the increasing of ST. Mn losses compensation is proposed by co-sputtered deposition. With such a purpose a variable electrical power was applied to the radio frequency (RF) Mn cathode. By increasing the electrical power applied to the RF Mn cathode both Mn and Ni contents approach to the targeted nominal composition Ni:Mn:Sn = 50:37:13. Elemental chemical composition analyses show that the composition varied between Ni61.5Mn26.2Sn12.3 and Ni54.6Mn30.5Sn14.9 when the applied RF-power increased from 0 W to 30 W."
dc.rightsAttribution-NonCommercial-NoDerivatives 4.0 Internacional
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subjectNi-Mn-Sn
dc.subjectMagnetic shape memory alloys
dc.subjectSputtering
dc.subjectco-sputtering deposition
dc.subject.classificationFÍSICA
dc.titleMicrostructure and composition design of magnetic Ni-Mn-Sn Co-sputter deposited films
dc.typearticle
dc.identifier.doihttps://doi.org/10.9734/JSRR/2015/16672
dc.rights.accessAcceso Abierto


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Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 Internacional